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Introduction to Lithography for Nanometer VLSI Manufacturing - rohini - 10-06-2017 Introduction to Lithography for Nanometer VLSI Manufacturing [attachment=17240] Optical Proximity Correction (OPC) Optical proximity correction (OPC) is a photolithography enhancement techniques commonly used to compensate the mask pattern for image errors due to diffraction or process effects[2]. Design for Manufacturability (DFM) A design methodologyincludes a set of techniquesto modify the design of ICs in order to improve: Functional yield, parametric yield, reliability Techniques includes: Substituting higher yield cellswhere permitted by timing, power, and routability. Changing the spacingand widthof the interconnect wires, where possible Optimizing the amount of redundancyin internal memories. Substituting fault tolerant(redundant) viasin a design where possible. Massively Parallel Mask-less Lithography (MPML2) E-beam lithography is capable of sub-20 nmpatterning. E-beam direct write technique eliminate the costof mask fabrication ( 2M USD.) and correction ( 1 week). Direct write technique is capable of patterning more complex patterns(e.g. Fresnel zone plate). Challenges: Integrate as many as possible beams into the system. Design an effective writing strategyto maximize system throughput. Electron-resist interaction(proximity effect) correction. Design a data transfersystem to process huge data at one time. |