Thread / Post | Tags | ||
Title: Nanoventions Micro-optic Modeling and Control of Micro-Scale Systems Page Link: Nanoventions Micro-optic Modeling and Control of Micro-Scale Systems - Posted By: poojasundrani Created at: Thursday 17th of August 2017 06:06:07 AM | |||
On the macro scale, feedback control is routinely applied to improve performance and enable new tasks in complex and uncertain systems operating in noisy environments. Our lab has focused on applying feedback control ideas to systems on the micro scale. Here we show how control methods can improve existing performance in the UCLA lab-on-a-chip electrowetting system and can create entirely new capabilities in our 'micro fluidic tweezers' cell steering devices.In the Electro-Wetting-On-Dielectric (EWOD) system developed at UCLA by CJ Kim, a grid ....etc | |||
| |||
Title: laser polishing using dualbeam technology ppt Page Link: laser polishing using dualbeam technology ppt - Posted By: rinkuraichel Created at: Thursday 17th of August 2017 08:32:35 AM | |||
In this publication laser micro polishing with an additional laser beam for pre-heating of the surface is investigated.The influence of the following process parameters on the surface roughness is examined: Pre-heating laser power, scanning velocity, beam offset of the two laser beams, and intensity distribution of the pre-heating laser beam. The two materials which were used for the experiments (martensitic tool steel and TiAl6V4) showed a different behavior: For martensitic tool steel the micro roughness was increased in comparison to convent ....etc | |||
| |||
Title: automatic shoe polishing machine ppt Page Link: automatic shoe polishing machine ppt - Posted By: sahooamarjeet Created at: Thursday 05th of October 2017 05:07:04 AM | |||
automatic shoe polishing machine ppt | |||
Title: laser cleaning of micro slots and cracks Page Link: laser cleaning of micro slots and cracks - Posted By: chetan7675 Created at: Thursday 05th of October 2017 05:34:06 AM | |||
laser cleaning of micro slots and cracks | |||
Title: pulsed leaser micro polishing seminars report and ppt Page Link: pulsed leaser micro polishing seminars report and ppt - Posted By: rakhichandran Created at: Thursday 17th of August 2017 05:26:45 AM | |||
pulsed leaser micro polishing seminar report and ppt | |||
Title: Laser micro fabrication technologies on RF MEMS Page Link: Laser micro fabrication technologies on RF MEMS - Posted By: rakesh nath Created at: Thursday 05th of October 2017 04:52:04 AM | |||
Laser micro fabrication technologies on RF MEMS | |||
Title: pulsed laser micro polishing seminars ppt Page Link: pulsed laser micro polishing seminars ppt - Posted By: nidhinsp Created at: Thursday 05th of October 2017 05:38:42 AM | |||
pulsed laser micro polishing seminar ppt | |||
Title: laser communication seminars report using lm386 and laser diode Page Link: laser communication seminars report using lm386 and laser diode - Posted By: erhardeepsingh Created at: Thursday 17th of August 2017 05:52:30 AM | |||
ffhdedssdfgsdgdsgdgdgdgdgdgsdg ....etc | |||
Title: Laser Micro-Patterning by Means of Optical Fibers with Micro-grinded Lens End Faces Page Link: Laser Micro-Patterning by Means of Optical Fibers with Micro-grinded Lens End Faces - Posted By: vijay Created at: Thursday 17th of August 2017 07:57:53 AM | |||
Laser Micro-Patterning by Means of Optical Fibers with Micro-grinded Lens End Faces | |||
Title: The effect of hydrogen peroxide on polishing removal rate in CMP with various abrasi Page Link: The effect of hydrogen peroxide on polishing removal rate in CMP with various abrasi - Posted By: kadesh s b Created at: Thursday 17th of August 2017 05:58:17 AM | |||
Chemical Mechanical Planarization (CMP) is an important process in semiconductor chip fabrication. In the CMP process, excess material is removed and the surface is planarized by the action of chemical and mechanical forces. Shallow Trench Isolation (STI) has become a key technology for device isolation in recent times. In this method, a shallow trench is made on the silicon wafer between active devices, silicon dioxide is deposited over the trench as well as the active area and the excess silicon dioxide is removed by CMP. The oxide remaining ....etc | |||
Please report us any abuse/complaint to "omegawebs @ gmail.com" |