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Title: pulsed leaser micro polishing seminars report and ppt
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Posted By: rakhichandran
Created at: Thursday 17th of August 2017 05:26:45 AM
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pulsed leaser micro polishing seminar report and ppt

Abstract:

A fundamental study of pulsed laser micro polishing (PL P) was conducted as a method for reducing surface roughness of micro/meso-scale metallic parts. Although PL P was shown to be an effective process at these scales, the knowledge of the process physics lacked thoroughness. The goal of this work, therefore was to improve upon the existing knowledge of PL P, with focus on developing physics based models, understanding the effects of various process parameters and developing s ....etc

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Title: pulsed laser micro polishing seminars ppt
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Posted By: nidhinsp
Created at: Thursday 05th of October 2017 05:38:42 AM
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pulsed laser micro polishing seminar ppt

Abstract
The objective of this work is to predict the final roughness of metal surfaces that have undergone pulsed laser micro polishing. The motivation for pulsed laser micro polishing is to reduce the surface roughness of parts whose surface texture can approach the feature size. Being able to predict the magnitude of the polishing and frequency (wavelength) content of the surface will assist in the design of optimal processing parameters with minimal experiments. Laser pulses are used to create shall ....etc

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Title: Laser Micro-Patterning by Means of Optical Fibers with Micro-grinded Lens End Faces
Page Link: Laser Micro-Patterning by Means of Optical Fibers with Micro-grinded Lens End Faces -
Posted By: vijay
Created at: Thursday 17th of August 2017 07:57:53 AM
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Laser Micro-Patterning by Means of Optical Fibers with Micro-grinded Lens End Faces



Introduction

Nano-patterning of polymer surface has found a wide range of applications including biotechnology, where holes in the size of hundreds nm can influence the growth and differentiation of relatively large living cells . Instead of the e-beam patterning technique used in the Ref. 1, we ap-plied direct writing by laser-light. In our previous papers , we have demonstrated that th ....etc

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Title: laser polishing using dualbeam technology ppt
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Posted By: rinkuraichel
Created at: Thursday 17th of August 2017 08:32:35 AM
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In this publication laser micro polishing with an additional laser beam for pre-heating of the surface is investigated.The influence of the following process parameters on the surface roughness is examined: Pre-heating laser power, scanning velocity, beam offset of the two laser beams, and intensity distribution of the pre-heating laser beam. The two materials which were used for the experiments (martensitic tool steel and TiAl6V4) showed a different behavior: For martensitic tool steel the micro roughness was increased in comparison to convent ....etc

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Title: Nanoventions Micro-optic Modeling and Control of Micro-Scale Systems
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Posted By: poojasundrani
Created at: Thursday 17th of August 2017 06:06:07 AM
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On the macro scale, feedback control is routinely applied to improve performance and enable new tasks in complex and uncertain systems operating in noisy environments. Our lab has focused on applying feedback control ideas to systems on the micro scale. Here we show how control methods can improve existing performance in the UCLA lab-on-a-chip electrowetting system and can create entirely new capabilities in our 'micro fluidic tweezers' cell steering devices.In the Electro-Wetting-On-Dielectric (EWOD) system developed at UCLA by CJ Kim, a grid ....etc

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Title: automatic shoe polishing machine ppt
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Posted By: sahooamarjeet
Created at: Thursday 05th of October 2017 05:07:04 AM
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Shoe polish (or boot polish), is a waxy paste, cream, or liquid used to polish, shine, and waterproof leather shoes or boots to extend the footwear's life, and restore, maintain and improve their appearance.Various substances have been used as shoe polish for hundreds of years, starting with natural substances such as wax and tallow. Modern polish formulas were introduced early in the 20th century and many of those original formulations are still in use today. Today, shoe polish is usually made from a mix o ....etc

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Title: Pulsed Spray Metal Transfer
Page Link: Pulsed Spray Metal Transfer -
Posted By: imduuu
Created at: Thursday 17th of August 2017 06:04:13 AM
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Pulsed Spray Metal Transfer

What is Pulsed Spray Metal Transfer?

Pulsed spray metal transfer
(GMAW-P) takes advantage
of the high energy of Axial Spray
Metal Transfer, and alternates
this high energy (peak) current
with a lower energy (background)
current. Each cycle is called
a period, and the period can
repeat several hundred times
per second.

The Adaptive Loop

Many pulsed spray metal transfer software programs
are designed with an adaptive loop , which dictates
the way ....etc

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Title: Pulsed Detonation Thermal Spray
Page Link: Pulsed Detonation Thermal Spray -
Posted By: rajanpatel
Created at: Thursday 05th of October 2017 03:27:20 AM
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Pulsed Detonation Thermal Spray

Abstract

Pulsed detonation thermal spray coating is used to enhance the material properties at the surface of an object. The present research implements computational fluid dynamic modeling to identify the efficiency of energy and mass delivered to potential target locations. Six cases of a hydrogen-air mixture are used to investigate the gas flow from the instant of ignition to the instant of flow reversal ....etc

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Title: pulsed detonation engines ppt
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Posted By: vineeth
Created at: Thursday 17th of August 2017 04:53:30 AM
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if you again feel trouble on pulsed detonation engines ppt please reply in that page and ask specific fields in pulsed detonation engines ppt ....etc

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Title: The effect of hydrogen peroxide on polishing removal rate in CMP with various abrasi
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Posted By: kadesh s b
Created at: Thursday 17th of August 2017 05:58:17 AM
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Chemical Mechanical Planarization (CMP) is an important process in semiconductor chip fabrication. In the CMP process, excess material is removed and the surface is planarized by the action of chemical and mechanical forces. Shallow Trench Isolation (STI) has become a key technology for device isolation in recent times. In this method, a shallow trench is made on the silicon wafer between active devices, silicon dioxide is deposited over the trench as well as the active area and the excess silicon dioxide is removed by CMP. The oxide remaining ....etc

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