Extreme programming (XP) is a lightweight methodology for small-to-medium sized teams developing software in the face of vague or rapidly changing requirements.XP is a deliberate and disciplined approach to software development.Requirement specification in the form of User Stories, code development by pairs of developers (Pair Programming), simplification of the code through Refactoring and careful repeated testing are the outstanding features of extreme Programming technique. XP improves a softw ....etc

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You often hear that beauty is just skin deep. The truth goes much deeper. Your appearance can have a big effect on how others perceive you. Because this happens, all you need to keep in mind is to look as great as possible. This article will help with that. ....etc

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INTRODUCTION

Extreme Programming (XP) is actually a deliberate and disciplined approach to software development. About six years old, it has already been proven at many companies of all different sizes and industries worldwide. XP is successful because it stresses customer satisfaction. The methodology is designed to deliver the software your customer needs when it is needed. XP empowers software developers to confidently respond to changing customer requirements, even late in the life cycle. This methodology also emphasiz ....etc

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hi friend you can refer these pages to get the ppt on extreme ultraviolet lithography

http://seminarsprojects.net/Thread-extreme-ultraviolet-lithography-full-report?pid=11179#pid11179

http://seminarsprojects.net/Thread-extreme-ultraviolet-lithography-full-report?pid=14535#pid14535 ....etc

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INTRODUCTION
Microprocessors, also called computer chips, are made using a process called lithography. Specifically, deep-ultraviolet lithography is used to make the current breed of microchips and was most likely used to make the chip that is inside your computer.
Lithography is akin to photography in that it uses light to transfer images onto a substrate. Silicon is the traditional substrate used in chip making. To create the integrated circuit design that's on a microprocessor, light is directed onto a mask. A ....etc

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ABSTRACT

Silicon has been the heart of the world's technology boom for nearly half a century. Each year, manufacturers bring out the next great computer chip that boosts computing power and allows our Personal Computers to do more than we imagined just a decade ago. The current technology used to make microprocessors, deep ultraviolet lithography will begin to reach its limit around 2005. At that time, chipmakers will have to look to other technologies to cram more transistors onto silicon to create powerful chips. Many ....etc

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ABSTRACT

This paper discusses the basic concepts and current state of development of EUV lithography (EUVL), a relatively new form lithography that uses extreme ultraviolet (EUV) radiation with a wavelength in the range of 10 to 14 nanometer (nm) to carry out projection imaging. Currently, and for the last several decades, optical projection lithography has been the lithographic technique used in the high-volume manufacture of integrated circuits. It is widely anticipated that improvements in this technology will allow it to remain the sem ....etc

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ABSTRACT
Extreme programming (XP) is a lightweight methodology for small-to-medium sized teams developing software in the face of vague or rapidly changing requirements. XP is a deliberate and disciplined approach to software development. XP stresses consumer satisfaction. An extreme attempt to dramatically simplify the process of developing software systems is made focusing on what delivers value: the requirements for the system or the code that implements the system. Requirement specification in the form of User Stories, c ....etc

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Extreme ultraviolet lithography (also known as EUV or EUVL) is the next generation lithography technology using extreme ultraviolet (EUV) wavelength, currently expected to be 13.5 nm. EUV is currently being developed for possible further use in conjunction with Immersion Lithography with a resolution step 32 nm, sometimes referred to as node 7 nm. Primary EUV tool manufacturer, ASML EUV projects with 5 nm node requires a higher numerical aperture than at present and multiple pattern to a greater extent than in immersion lithography 20 nm no ....etc

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